Electrochemical deposition of apatite on titanium substrates by using pulse current

Masakazu Kawashita, Tomoyasu Hayakawa, Gikan H. Takaoka

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

An apatite layer was successfully formed on titanium substrates by electrochemical deposition under a pulse current in a metastable calcium phosphate solution, which had 1.5 times the ion concentrations of a normal simulated body fluid, but did not contain MgCl2·6H 2O, at 40°C for 30, 60, 90 and 120 minutes at the average current density of 10 mA/cm2. The thickness of the apatite layer was increased with increasing deposition time. The pulse-current deposition produced the thicker apatite layer than the direct-current deposition, and gave some effects on the surface morphology of the apatite. The pre-treatment using acid solution gave a better adhesive between apatite and substrate. It is expected that the present electrochemical deposition under a pulse current will be useful to rapidly coat apatite on metallic materials.

Original languageEnglish
Pages (from-to)629-632
Number of pages4
JournalKey Engineering Materials
Volume361-363 I
Publication statusPublished - 2008 Jan 1

Keywords

  • Apatite
  • Electrochemical deposition
  • Pulse current
  • Simulated body fluid
  • Titanium

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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