Electrochemical and XPS studies of the corrosion behavior of sputter-deposited amorphous W-Zr alloys in 6 and 12 M HCl solutions

J. Bhattarai, E. Akiyama, H. Habazaki, A. Kawashima, K. Asami, K. Hashimoto

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

Amorphous W-Zr alloys containing 23-76 at% zirconium have been successfully prepared by DC magnetron sputtering. The W-Zr alloys are spontaneously passive and show significantly high corrosion resistance in 6 and 12 M HCl solutions. In particular, their corrosion resistance in 12 M HCl is higher than that of the alloy constituents. The pitting resistance of zirconium is greatly improved by alloying with tungsten. XPS analysis showed that zirconium is enriched in both the air-formed films and the passive films in HCl solutions. From angular-dependent XPS measurements, the passive films on W-Zr alloys are found to be composed of the double oxyhydroxide of tungsten and zirconium ions, although there are some concentration gradients of tungsten and zirconium ions. The formation of the homogeneous double oxyhydroxide of tungsten and zirconium ions acts synergistically in improving the corrosion resistance of W-Zr alloys in HCl solutions open to air at 30°C.

Original languageEnglish
Pages (from-to)355-375
Number of pages21
JournalCorrosion Science
Volume39
Issue number2
DOIs
Publication statusPublished - 1997 Feb

Keywords

  • A. alloy
  • A. zirconium
  • B. XPS
  • C. amorphous structures
  • C. pitting corrosion

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Science(all)

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