Electrochemical and XPS studies of the corrosion behavior of sputter-deposited W-Nb alloys in concentrated hydrochloric acid solutions

J. Bhattarai, Eiji Akiyama, H. Habazaki, A. Kawashima, K. Asami, K. Hashimoto

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

Amorphous W-Nb alloys containing 52-78 at% niobium have been prepared successfully by DC magnetron sputtering. The W-Nb alloys are passivated spontaneously and show high corrosion resistance in both 6 and 12 M HCl solutions at 30°C. In particular, their corrosion rates in 12 M HCl solution are about one order of magnitude lower than those of tungsten and niobium. Analysis by X-ray photoelectron spectroscopy (XPS) shows that tungsten is slightly enriched in the spontaneously passive films formed on the alloys after immersion for a long time in HCl solutions at 30°C, and the passive films are composed of double oxyhydroxides of tungsten and niobium ions. Angle-resolved XPS measurements reveal that tungsten and niobium ions are homogeneously distributed throughout the passive films. The formation of the spontaneous passive film composed of the homogeneous double oxyhydroxide of tungsten and niobium ions is responsible for the high corrosion resistance of the W-Nb alloys.

Original languageEnglish
Pages (from-to)19-42
Number of pages24
JournalCorrosion Science
Volume40
Issue number1
DOIs
Publication statusPublished - 1998 Jan 1

Keywords

  • A. alloys
  • B. X-ray diffraction
  • B. XPS
  • C. passive films
  • C. sputtered films

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Science(all)

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