Electrically conducting, ultra-sharp, high aspect-ratio probes for AFM fabricated by electron-beam-induced deposition of platinum

Jason Brown, Paul Kocher, Chandra S. Ramanujan, David N. Sharp, Keiichi Torimitsu, John F. Ryan

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Abstract

We report on the fabrication of electrically conducting, ultra-sharp, high-aspect ratio probes for atomic force microscopy by electron-beam-induced deposition of platinum. Probes of 4.0 ±1.0. nm radius-of-curvature are routinely produced with high repeatability and near-100% yield. Contact-mode topographical imaging of the granular nature of a sputtered gold surface is used to assess the imaging performance of the probes, and the derived power spectral density plots are used to quantify the enhanced sensitivity as a function of spatial frequency. The ability of the probes to reproduce high aspect-ratio features is illustrated by imaging a close-packed array of nanospheres. The electrical resistance of the probes is measured to be of order 100. kΩ.

Original languageEnglish
Pages (from-to)62-66
Number of pages5
JournalUltramicroscopy
Volume133
DOIs
Publication statusPublished - 2013 Oct 1
Externally publishedYes

Keywords

  • AFM probes
  • Conducting AFM
  • Electron-beam-induced deposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation

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