Electrical resistivity and Mössbauer studies for the structural relaxation process in Pd-Cu-Ni-P glasses

Osami Haruyama, Hisamichi M. Kimura, Nobuyuki Nishiyama, Akihisa Inoue, Juichiro Arai

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16 Citations (Scopus)


The structural relaxation process in several Pd-Cu-Ni-P glasses was investigated by the electrical resistivity and the Mössbauer experiments. The change in the resistivity, ρ(300), and the corresponding slope, α(300) = (dρ/dT)300, at room temperature was measured after a given heat treatment. The change in ρ(300) with isochronal annealing below the glass transition temperature (≈ 572 K), starting from room temperature, demonstrated that the ρ(300) increased with temperature and decreased beyond 550 K. The isothermal annealing at 570 K exhibited that the ρ(300) showed an increase, about 1%, during an initial annealing stage for 3.0 × 102 s and remained almost constant up to 6.0 × 103 s, and hereafter monotonously decreased. The change in α(300) showed an opposite sign to that in ρ(300). The reversible change in ρ(300) due to isochronal annealing was observed in the heat treatment repeated between 350 and 550 K. The Mössbauer spectroscopy experiments were performed at room temperature to investigate the local structure change due to structural relaxation. The isomer shift and the quadrupole splitting for an annealed sample decreased in comparison with that of an as-quenched sample. Based on these results, the structural relaxation process and the structure change were discussed within the framework of the free volume model.

Original languageEnglish
Pages (from-to)1931-1936
Number of pages6
JournalMaterials Transactions
Issue number8
Publication statusPublished - 2002 Aug


  • Electrical resistivity
  • Free volume model
  • Mössbauer spectroscopy
  • Structural relaxation
  • Weak localization

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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