Electrical resistance change due to hydrogenation of Pd and Pd-Ni thin films immersed in hydrogen-dissolved water

Shin Ichi Yamaura, Tokujiro Yamamoto, Hisamichi Kimura, Akihisa Inoue

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    The Pd and Pd-Ni thin films with an fee structure were prepared by sputtering. The films were immersed in the pure water and the hydrogen-dissolved water alternatively and the electrical resistance of the films was measured during the immersion. The Pd and Pd-Ni thin films possess good sensitivity to hydrogen dissolved in water. The electrical resistance of the films increases in the hydrogen-dissolved water and decreases in the pure water with excellent reproducibility. The electrical resistance change of the Pd-Ni alloy films is smaller than that of the Pd films. Nickel addition improves the response of increase/decrease of the electrical resistance during the immersion in the pure water and the hydrogen-dissolved water. The detailed electrical behavior of the films is investigated in this study.

    Original languageEnglish
    Pages (from-to)1687-1691
    Number of pages5
    JournalMaterials Transactions
    Volume46
    Issue number7
    DOIs
    Publication statusPublished - 2005 Jul

    Keywords

    • Electrical resistance
    • Hydrogen-dissolved water
    • Palladium

    ASJC Scopus subject areas

    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

    Fingerprint Dive into the research topics of 'Electrical resistance change due to hydrogenation of Pd and Pd-Ni thin films immersed in hydrogen-dissolved water'. Together they form a unique fingerprint.

    Cite this