Abstract
The Pd and Pd-Ni thin films with an fee structure were prepared by sputtering. The films were immersed in the pure water and the hydrogen-dissolved water alternatively and the electrical resistance of the films was measured during the immersion. The Pd and Pd-Ni thin films possess good sensitivity to hydrogen dissolved in water. The electrical resistance of the films increases in the hydrogen-dissolved water and decreases in the pure water with excellent reproducibility. The electrical resistance change of the Pd-Ni alloy films is smaller than that of the Pd films. Nickel addition improves the response of increase/decrease of the electrical resistance during the immersion in the pure water and the hydrogen-dissolved water. The detailed electrical behavior of the films is investigated in this study.
Original language | English |
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Pages (from-to) | 1687-1691 |
Number of pages | 5 |
Journal | Materials Transactions |
Volume | 46 |
Issue number | 7 |
DOIs | |
Publication status | Published - 2005 Jul |
Keywords
- Electrical resistance
- Hydrogen-dissolved water
- Palladium
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering