TY - JOUR
T1 - Electrical investigation of notch width dependence of domain wall structure in Co/Ni Nanowires
AU - Kondou, Kouta
AU - Hiramatsu, Ryo
AU - Koyama, Tomohiro
AU - Nakatani, Yoshinobu
AU - Chiba, Daichi
AU - Fukami, Shunsuke
AU - Ishiwata, Nobuyuki
AU - Ono, Teruo
PY - 2011/7
Y1 - 2011/7
N2 - We have investigated the notch width dependence of the domain wall structure by measuring the wall resistances in Co/Ni nanowires with perpendicular magnetization. Wall resistance was abruptly increased below a notch width of 43 nm. By comparing the experimental results with theoretical calculations of wall resistance and the micromagnetic simulation of wall energy, this increase in wall resistance was found to be caused by the change in the wall structure from the Bloch to Néel wall caused by the decreased notch width.
AB - We have investigated the notch width dependence of the domain wall structure by measuring the wall resistances in Co/Ni nanowires with perpendicular magnetization. Wall resistance was abruptly increased below a notch width of 43 nm. By comparing the experimental results with theoretical calculations of wall resistance and the micromagnetic simulation of wall energy, this increase in wall resistance was found to be caused by the change in the wall structure from the Bloch to Néel wall caused by the decreased notch width.
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U2 - 10.1143/JJAP.50.073002
DO - 10.1143/JJAP.50.073002
M3 - Article
AN - SCOPUS:79960659195
VL - 50
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 7 PART 1
M1 - 073002
ER -