Electrical investigation of notch width dependence of domain wall structure in Co/Ni Nanowires

Kouta Kondou, Ryo Hiramatsu, Tomohiro Koyama, Yoshinobu Nakatani, Daichi Chiba, Shunsuke Fukami, Nobuyuki Ishiwata, Teruo Ono

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

We have investigated the notch width dependence of the domain wall structure by measuring the wall resistances in Co/Ni nanowires with perpendicular magnetization. Wall resistance was abruptly increased below a notch width of 43 nm. By comparing the experimental results with theoretical calculations of wall resistance and the micromagnetic simulation of wall energy, this increase in wall resistance was found to be caused by the change in the wall structure from the Bloch to Néel wall caused by the decreased notch width.

Original languageEnglish
Article number073002
JournalJapanese journal of applied physics
Volume50
Issue number7 PART 1
DOIs
Publication statusPublished - 2011 Jul
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint

Dive into the research topics of 'Electrical investigation of notch width dependence of domain wall structure in Co/Ni Nanowires'. Together they form a unique fingerprint.

Cite this