The behavior of Cu contamination at the backside surface of a thinned wafer in a three-dimensional (3D) LSI was electrically evaluated by capacitance-time (C-t) analysis. In order to electrically evaluate Cu diffusion characteristics, MOS capacitors were fabricated using the thinned wafer of 50 μm and 100 μm thickness, respectively. For an accelerated Cu diffusion test, a thin Cu layer was deposited at the back surface as a contamination source. Cu atoms were artificially diffused into the substrate by annealing at 200 °C and 300 °C for various times in nitrogen ambient. The C-t curves of a MOS capacitor formed on a 100 μm thickness substrate were degraded even after annealing at 200 °C. It means that Cu atoms diffuse into the active region and reach the Si-SiO2 interface during relatively low-temperature annealing. By increasing time and temperature, the transient time tf is more seriously decreased. The C-t curves of the MOS capacitor formed on the Si substrate of 50 μm thickness were more seriously degraded even after the initial annealing at 200 °C for 5 min. These results indicate that the Cu contamination issue becomes more severe in a thinner Si substrate.This study shows that C-t analysis is a highly promising method to electrically evaluate the influence of Cu contamination on device reliability in the 3D LSI.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry