Electrical characteristics of epitaxial CeO2 on Si(111)

L. Tye, N. A. El-Masry, Toyohiro Chikyo, P. McLarty, S. M. Bedair

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Abstract

Electrical properties of epitaxial CeO2 thin films on silicon (111) substrates grown in ultrahigh vacuum were studied, varying growth conditions and ex situ thermal treatments. Characterization using reflection high-energy electron diffraction and high resolution transmission electron microscopy reveal that while the ceramic layers have a good single-crystal structure, a dual amorphous layer of CeOx and SiO2 forms at the CeO2/Si interface. This structure has undesirable electrical properties, however, utilizing a post-anneal in dry oxygen, the α-CeO x layer was removed and the SiO2 amorphous layer was made thicker. This newly developed structure benefits from the SiO2/Si interface, having Dit=6×1011 cm-2, and Qf=5×1011 cm-2. The structure exhibits a high capacitance due to the large dielectric constant of CeO2, has electrical properties comparable with those of other reported gate insulators on Si, and has an epitaxial oxide lattice matched to Si.

Original languageEnglish
Pages (from-to)3081-3083
Number of pages3
JournalApplied Physics Letters
Volume65
Issue number24
DOIs
Publication statusPublished - 1994 Dec 1
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Tye, L., El-Masry, N. A., Chikyo, T., McLarty, P., & Bedair, S. M. (1994). Electrical characteristics of epitaxial CeO2 on Si(111). Applied Physics Letters, 65(24), 3081-3083. https://doi.org/10.1063/1.112467