TY - JOUR
T1 - Electrical activation of Te and Se in GaAs at extremely heavy doping up to 5×1020 cm-3 prepared by intermittent injection of TEG/AsH3 in ultra-high vacuum
AU - Oyama, Yutaka
AU - Nishizawa, Jun ichi
AU - Seo, Kohichi
AU - Suto, Ken
PY - 2000/5
Y1 - 2000/5
N2 - Doping characteristics of group VI elements (Te and Se) on (1 0 0)-oriented GaAs are investigated at an extremely heavy doping level up to 5×1020 cm-3 on the basis of the surface stoichiometry control to improve the incorporation of impurities. By changing the gas injection sequences, the surface stoichiometry before the introduction of impurity precursors is controlled. The impurity concentration is measured by secondary ion mass spectroscopy (SIMS) analysis and the activation ratio is determined in conjunction with the results of Hall effect measurements. It is shown that the incorporation of Te and Se is extremely enhanced when DETe and DESe are exposed on the Ga-stabilized surface. From the electrical measurements and SIMS results, the segregation of defects due to doped impurity atoms is strongly suggested. The defect formation mechanism of heavily impurity doped GaAs is discussed in view of the formation of impurity-defect complex and the control of site-occupation of doped impurities.
AB - Doping characteristics of group VI elements (Te and Se) on (1 0 0)-oriented GaAs are investigated at an extremely heavy doping level up to 5×1020 cm-3 on the basis of the surface stoichiometry control to improve the incorporation of impurities. By changing the gas injection sequences, the surface stoichiometry before the introduction of impurity precursors is controlled. The impurity concentration is measured by secondary ion mass spectroscopy (SIMS) analysis and the activation ratio is determined in conjunction with the results of Hall effect measurements. It is shown that the incorporation of Te and Se is extremely enhanced when DETe and DESe are exposed on the Ga-stabilized surface. From the electrical measurements and SIMS results, the segregation of defects due to doped impurity atoms is strongly suggested. The defect formation mechanism of heavily impurity doped GaAs is discussed in view of the formation of impurity-defect complex and the control of site-occupation of doped impurities.
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U2 - 10.1016/S0022-0248(00)00206-2
DO - 10.1016/S0022-0248(00)00206-2
M3 - Article
AN - SCOPUS:0034188120
VL - 212
SP - 402
EP - 410
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
SN - 0022-0248
IS - 3
ER -