Elastic properties of indium nitrides grown on sapphire substrates determined by nano-indentation: In comparison with other nitrides

Ichiro Yonenaga, Yasushi Ohkubo, Momoko Deura, Kentaro Kutsukake, Yuki Tokumoto, Yutaka Ohno, Akihiko Yoshikawa, Xin Qiang Wang

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11 Citations (Scopus)

Abstract

The hardness of wurtzite indium nitride (α-InN) films of 0.5 to 4 μm in thickness was measured by the nano-indentation method at room temperature. After investigation of crystalline quality by x-ray diffraction, the hardness and Young's modulus were determined to be 8.8 ± 0.4 and 184 ± 5 GPa, respectively, for the In (0001)- and N (000 1) -growth faces of InN films. The bulk and shear moduli were then derived to be 99 ± 3 and 77 ± 2 GPa, respectively. The Poisson's ratio was evaluated to be 0.17 ± 0.03. The results were examined comprehensively in comparison with previously reported data of InN as well as those of other nitrides of aluminum nitride and gallium nitride. The underlying physical process determining the moduli and hardness was examined in terms of atomic bonding and dislocation energy of the nitrides and wurtzite zinc oxide.

Original languageEnglish
Article number077131
JournalAIP Advances
Volume5
Issue number7
DOIs
Publication statusPublished - 2015 Jul 1

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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