Effects of water desorption from SiO2 substrates on the thickness of manganese oxide diffusion barrier layer formed by chemical vapor deposition

Kenji Matsumoto, Koji Neishi, Hitoshi Itoh, Hidenori Miyoshi, Hiroshi Sato, Shigetoshi Hosaka, Junichi Koike

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

A manganese oxide (MnOx ) diffusion barrier layer was formed by chemical vapor deposition (CVD) on SiO2 substrates with or without preannealing. The thickness dependence of the MnOx layer was investigated in relation to the desorption behavior of water vapor from the substrates. A good correlation was found between MnOx thickness and the amount of desorbed water vapor. It is necessary to control the amount of absorbed water in the substrate to form a thin MnOx barrier layer with good thickness reproducibility.

Original languageEnglish
Pages (from-to)05FA121-05FA122
JournalJapanese journal of applied physics
Volume49
Issue number5 PART 3
DOIs
Publication statusPublished - 2010 May 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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