Effects of water desorption from SiO2 substrates on the thickness of manganese oxide diffusion barrier layer formed by chemical vapor deposition

Kenji Matsumoto; Koji Neishi; Hitoshi Itoh; Hidenori Miyoshi; Hiroshi Sato; Shigetoshi Hosaka; Junichi Koike

doi:10.1143/JJAP.49.05FA12

Effects of water desorption from SiO₂ substrates on the thickness of manganese oxide diffusion barrier layer formed by chemical vapor deposition

Kenji Matsumoto, Koji Neishi, Hitoshi Itoh, Hidenori Miyoshi, Hiroshi Sato, Shigetoshi Hosaka, Junichi Koike

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

A manganese oxide (MnO_x ) diffusion barrier layer was formed by chemical vapor deposition (CVD) on SiO₂ substrates with or without preannealing. The thickness dependence of the MnO_x layer was investigated in relation to the desorption behavior of water vapor from the substrates. A good correlation was found between MnO_x thickness and the amount of desorbed water vapor. It is necessary to control the amount of absorbed water in the substrate to form a thin MnO_x barrier layer with good thickness reproducibility.

Original language	English
Pages (from-to)	05FA121-05FA122
Journal	Japanese journal of applied physics
Volume	49
Issue number	5 PART 3
DOIs	https://doi.org/10.1143/JJAP.49.05FA12
Publication status	Published - 2010 May 1

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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Effects of water desorption from SiO₂ substrates on the thickness of manganese oxide diffusion barrier layer formed by chemical vapor deposition. / Matsumoto, Kenji; Neishi, Koji; Itoh, Hitoshi; Miyoshi, Hidenori; Sato, Hiroshi; Hosaka, Shigetoshi; Koike, Junichi.

In: Japanese journal of applied physics, Vol. 49, No. 5 PART 3, 01.05.2010, p. 05FA121-05FA122.

Research output: Contribution to journal › Article › peer-review

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AU - Sato, Hiroshi

AU - Hosaka, Shigetoshi

AU - Koike, Junichi

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AB - A manganese oxide (MnOx ) diffusion barrier layer was formed by chemical vapor deposition (CVD) on SiO2 substrates with or without preannealing. The thickness dependence of the MnOx layer was investigated in relation to the desorption behavior of water vapor from the substrates. A good correlation was found between MnOx thickness and the amount of desorbed water vapor. It is necessary to control the amount of absorbed water in the substrate to form a thin MnOx barrier layer with good thickness reproducibility.

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Effects of water desorption from SiO₂ substrates on the thickness of manganese oxide diffusion barrier layer formed by chemical vapor deposition

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