Effects of substrate self-bias and nitrogen flow rate on non-polar AlN film growth by reactive sputtering

Kota Tatejima, Takahiro Nagata, Keiji Ishibashi, Kenichiro Takahashi, Setsu Suzuki, Atsushi Ogura, Toyohiro Chikyow

Research output: Contribution to journalArticlepeer-review

Fingerprint Dive into the research topics of 'Effects of substrate self-bias and nitrogen flow rate on non-polar AlN film growth by reactive sputtering'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy