Effects of silicon source gas and substrate bias on the film properties of Si-incorporated diamond-like carbon by radio-frequency plasma-enhanced chemical vapor deposition

Hideki Nakazawa, Takeshi Kinoshita, Yuhta Kaimori, Yuhki Asai, Maki Suemitsu, Toshimi Abe, Kanji Yasui, Tetsuo Endoh, Takashi Itoh, Yuzuru Narita, Yoshiharu Enta, Masao Mashita

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Engineering & Materials Science

Physics & Astronomy