Effects of refraction of x-rays in double-crystal topography

Michio Niwano, Akira Kanai, Maki Suemitsu, Hirofumi Nakamura, Nobuo Miyamoto

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

We have investigated the effects of refraction of X-rays in double-crystal topography in the (+, -) Bragg-Bragg asymmetric arrangement, in which the angle of incidence of X-rays is very small. It is shown that in a double-crystal topograph of a sample having an uneven surface, the refraction effect gives rise to diffraction contrasts corresponding to the shape of the sample surface. This effect can be applied to an examination of surface roughness of a crystal and to a determination of a refractive index in the X-ray region. An attempt to derive the refractive index for silicon crystals has been made. The derived value was found to be in good agreement with the nominal one.

Original languageEnglish
Pages (from-to)849-854
Number of pages6
JournalJapanese journal of applied physics
Volume27
Issue number5R
DOIs
Publication statusPublished - 1988 May

Keywords

  • Double-crystal method
  • Refraction effect
  • Refractive index
  • Silicon
  • Surface roughness
  • X-ray topography

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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