TY - JOUR
T1 - Effects of multi-stepped negative biasing on microcrystalline diamond film formation with combustion-flame method
AU - Abe, Toshimi
AU - Suemitsu, Maki
AU - Miyamoto, Nobuo
PY - 1997/7
Y1 - 1997/7
N2 - Effects of voltage application to the substrate during microcrystalline diamond film formation by combustion-flame method have been investigated. When a negative voltage above 100 V was applied to the substrate with respect to the torch, both the growth rate and the deposited area increased. Especially, a multi-stepped increase of the biasing voltage presented remarkable effects, which include the increase of the growth rate by 300% and of the deposited area by 15%. These effects most probably come from the energetic ion showering, which may result in the enhanced surface migration of diamond precursors and/or the selective elimination of surface graphites.
AB - Effects of voltage application to the substrate during microcrystalline diamond film formation by combustion-flame method have been investigated. When a negative voltage above 100 V was applied to the substrate with respect to the torch, both the growth rate and the deposited area increased. Especially, a multi-stepped increase of the biasing voltage presented remarkable effects, which include the increase of the growth rate by 300% and of the deposited area by 15%. These effects most probably come from the energetic ion showering, which may result in the enhanced surface migration of diamond precursors and/or the selective elimination of surface graphites.
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U2 - 10.1016/S0022-0248(96)00907-4
DO - 10.1016/S0022-0248(96)00907-4
M3 - Article
AN - SCOPUS:0031191594
VL - 178
SP - 315
EP - 320
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
SN - 0022-0248
IS - 3
ER -