Effects of ion energy control on production of nitrogen-C60 compounds by ion implantation

Shigeyuki Abe, Genta Sato, Toshiro Kaneko, Takamichi Hirata, Rikizo Hatakeyama, Kuniyoshi Yokoo, Shoichi Ono, Kenji Omote, Yasuhiko Kasama

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

Nitrogen-C60 compounds such as azafullerene (C59N) and nitrogen-atom-encapsulated fullerene (N@C60) are produced by implanting nitrogen ions into C60 thin films on a substrate immersed in an electron cyclotron resonance plasma under a mirror magnetic field. Each compound is found to be synthesized, depending on the ion energy provided by the potential difference between the substrate and the plasma. The optimum energy for C59N synthesis is approximately 40-50 eV, and the amount of C59N decreases in an ion energy range larger than 50eV. In contrast, an ion energy larger than 2OeV is required for N@C60 synthesis.

Original languageEnglish
Pages (from-to)8340-8343
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number10 B
DOIs
Publication statusPublished - 2006 Oct 21

Keywords

  • CN
  • ECR
  • ESR
  • Fullerene
  • HPLC
  • N@C
  • Nitrogen
  • Plasma
  • TOF

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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