We have developed a cluster-eliminating filter which reduces amount of amorphous silicon nanoparticles (clusters) incorporated into a-Si:H films. We have measured film thickness dependence of a ratio of a hydrogen content associated with Si-H2 bonds (CSiH2) to that with Si-H bonds (CSiH) as a parameter of the filter gap (dgap). The cluster removal efficiency increases with decreasing dgap. CSiH2 and the ratio of CSiH2 to CSiH decrease with increasing the film thickness, suggesting the amount of incorporated clusters is high near the interface between the film and the substrate.
|Journal||Journal of Physics: Conference Series|
|Publication status||Published - 2014|
|Event||26th Symposium on Plasma Sciences for Materials, SPSM 2013 - Fukuoka, Japan|
Duration: 2013 Sep 23 → 2013 Sep 24
ASJC Scopus subject areas
- Physics and Astronomy(all)