Effects of annealing and quenching treatments on reconstruction of rutile thin films on sapphire substrates

Yeongsoo Choi, Shunya Yamamoto, Hiroaki Abe, Hisayosi Itoh

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

Morphology change in rutile TiO2 thin films on sapphire substrates prepared by pulsed laser deposition under reduced oxygen environment was investigated as a function of film thickness, temperature and cooling treatments with atomic force microscopy, X-ray diffraction and scanning electron microscopy equipped with X-ray spectroscopy (SEM/EDX). The deposited TiO2 was determined as epitaxially grown rutile films whose crystallographic correlation with substrates was (1 0 0)rutile//(0 0 0 1)sapphire. As increasing thickness of TiO2 films, smooth surface changed to island structure. In addition, the morphology of TiO2 film on α-Al2O3(0 0 0 1) varied drastically by annealing treatment from 973 to 1123 K. In case of ∼5 nm thickness films, morphology strongly depended on annealing and cooling treatments. We found interesting order structure of TiO2 islands at annealing temperature (∼1073 K) and subsequent quenching (∼1.3 K/s). Formation process of TiO2 particles on α-Al2O3(0 0 0 1) substrates is modeled based on instability of substrate at elevated temperatures.

Original languageEnglish
Pages (from-to)203-209
Number of pages7
JournalSurface Science
Volume499
Issue number2-3
DOIs
Publication statusPublished - 2002 Mar 1

Keywords

  • Atomic force microscopy
  • Laser methods
  • Titanium oxide

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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