Effect of UV/ozone treatment of the dielectric layer on the device performance of pentacene thin film transistors

Dong Guo, Shiro Entani, Susumu Ikeda, Koichiro Saiki

Research output: Contribution to journalArticlepeer-review

47 Citations (Scopus)

Abstract

The effect of UV/ozone treatment of the SiO2 dielectric layer on the film morphology and the electrical performance of the pentacene thin film transistors (TFTs) was investigated. Decreased threshold voltage and improved mobility were obtained after UV/ozone treatment. The effect of UV/ozone treatment of the substrate in modifying the film growth was distinguished from its effect in modifying the Au electrode by using a series of samples with different architectures. Electron spectroscopic measurement and film morphology observation indicated that the improved TFT performance was achieved mainly by the reduced contamination at the pentacene/SiO2 interface and the increased grain size.

Original languageEnglish
Pages (from-to)124-128
Number of pages5
JournalChemical Physics Letters
Volume429
Issue number1-3
DOIs
Publication statusPublished - 2006 Sep 29
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

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