Effect of thermal treatment on crystal growth of the surface monolayer

Masatsugu Shimomura, Koichi Fujii, Takehiko Shimamura, Masayuki Oguchi, Etsuo Shinohara, Yasuji Nagata, Masaki Matsubara, Kiyozo Koshiishi

    Research output: Contribution to journalArticlepeer-review

    31 Citations (Scopus)

    Abstract

    In order to anneal the surface monolayer uniformly, a new trough system with a flat panel heater and a fluorescence microscope was constructed. The recrystallization process during thermal treatment of the monolayer was directly monitored by a fluorescence microscope. The crystal size of a double-chain ammonium monolayer was extremely increased by the thermal treatment. The practical advantage of the flat panel heater on the thermal treatment was demonstrated as a uniform size distribution of the crystalline domains.

    Original languageEnglish
    Pages (from-to)98-100
    Number of pages3
    JournalThin Solid Films
    Volume210-211
    Issue numberPART 1
    DOIs
    Publication statusPublished - 1992 Apr 15

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

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