Effect of thermal treatment on crystal growth of the surface monolayer

Masatsugu Shimomura; Koichi Fujii; Takehiko Shimamura; Masayuki Oguchi; Etsuo Shinohara; Yasuji Nagata; Masaki Matsubara; Kiyozo Koshiishi

doi:10.1016/0040-6090(92)90179-F

Effect of thermal treatment on crystal growth of the surface monolayer

Masatsugu Shimomura, Koichi Fujii, Takehiko Shimamura, Masayuki Oguchi, Etsuo Shinohara, Yasuji Nagata, Masaki Matsubara, Kiyozo Koshiishi

Research output: Contribution to journal › Article › peer-review

32 Citations (Scopus)

Abstract

In order to anneal the surface monolayer uniformly, a new trough system with a flat panel heater and a fluorescence microscope was constructed. The recrystallization process during thermal treatment of the monolayer was directly monitored by a fluorescence microscope. The crystal size of a double-chain ammonium monolayer was extremely increased by the thermal treatment. The practical advantage of the flat panel heater on the thermal treatment was demonstrated as a uniform size distribution of the crystalline domains.

Original language	English
Pages (from-to)	98-100
Number of pages	3
Journal	Thin Solid Films
Volume	210-211
Issue number	PART 1
DOIs	https://doi.org/10.1016/0040-6090(92)90179-F
Publication status	Published - 1992 Apr 15

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/0040-6090(92)90179-F

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abstract = "In order to anneal the surface monolayer uniformly, a new trough system with a flat panel heater and a fluorescence microscope was constructed. The recrystallization process during thermal treatment of the monolayer was directly monitored by a fluorescence microscope. The crystal size of a double-chain ammonium monolayer was extremely increased by the thermal treatment. The practical advantage of the flat panel heater on the thermal treatment was demonstrated as a uniform size distribution of the crystalline domains.",

author = "Masatsugu Shimomura and Koichi Fujii and Takehiko Shimamura and Masayuki Oguchi and Etsuo Shinohara and Yasuji Nagata and Masaki Matsubara and Kiyozo Koshiishi",

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T1 - Effect of thermal treatment on crystal growth of the surface monolayer

AU - Shimomura, Masatsugu

AU - Fujii, Koichi

AU - Shimamura, Takehiko

AU - Oguchi, Masayuki

AU - Shinohara, Etsuo

AU - Nagata, Yasuji

AU - Matsubara, Masaki

AU - Koshiishi, Kiyozo

PY - 1992/4/15

Y1 - 1992/4/15

N2 - In order to anneal the surface monolayer uniformly, a new trough system with a flat panel heater and a fluorescence microscope was constructed. The recrystallization process during thermal treatment of the monolayer was directly monitored by a fluorescence microscope. The crystal size of a double-chain ammonium monolayer was extremely increased by the thermal treatment. The practical advantage of the flat panel heater on the thermal treatment was demonstrated as a uniform size distribution of the crystalline domains.

AB - In order to anneal the surface monolayer uniformly, a new trough system with a flat panel heater and a fluorescence microscope was constructed. The recrystallization process during thermal treatment of the monolayer was directly monitored by a fluorescence microscope. The crystal size of a double-chain ammonium monolayer was extremely increased by the thermal treatment. The practical advantage of the flat panel heater on the thermal treatment was demonstrated as a uniform size distribution of the crystalline domains.

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JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - PART 1

ER -

Effect of thermal treatment on crystal growth of the surface monolayer

Abstract

ASJC Scopus subject areas

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