Effect of the vacuum degree on the orientation and the microstructure of β-SiC films prepared by laser chemical vapour deposition

Li Bin Li, Qi Li, Hirokazu Katsui, Takashi Goto, Rong Tu

Research output: Contribution to journalComment/debate

2 Citations (Scopus)

Abstract

β-SiC films were prepared on AlN substrates by laser chemical vapour deposition (LCVD) using a diode laser and hydrido-polycarbosilane as a precursor at different vacuum degrees. The effect of the vacuum degree on the orientation and the microstructure of the β-SiC films was investigated. The preferred orientation of β-SiC films shifted from (111) to (311), the surface morphologies changed from faceted to rectangular and the columnar cross-section became thicker while increasing the vacuum degree from 0.4 to 7 KPa. The high deposition rate ranged from 180 to 240 µm/h.

Original languageEnglish
Pages (from-to)81-84
Number of pages4
JournalMaterials Letters
Volume182
DOIs
Publication statusPublished - 2016 Nov 1

Keywords

  • Laser chemical vapour deposition
  • Laser power
  • Microstructure
  • Orientation
  • SiC film
  • Thick films

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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