Effect of temperature on degradation of polymers for photoresist using ozone microbubbles

Kohei Matsuura, Takashi Nishiyama, Eriko Sato, Masashi Yamamoto, Tomosumi Kamimura, Masayoshi Takahashi, Kunihiko Koike, Hideo Horibe

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

We studied about an effect of temperature on degradation of polymers for photoresist using ozone microbubbles as an environmentally friendly cleaning technique. The dissolved ozone concentration of ozone microbubbles was decreased with the increasing temperature because the solubility of ozone gas was decreased and self-decomposition of ozone in water was promoted. While, the reactivity between ozone and novolak resin was increased with the increasing temperature. Consequently, novolak resin was most efficiently removed at around 23 ºC. The activated energy for removal of novolak resin using ozone microbubbles was 23 kJ/mol determined from Arrhenius plots. Polyvinyl phenol was removed by ozone microbubbles, and its removal rate was comparable with that of novolak resin. Polymethyl methacrylate without C=C bond or benzene ring structure could not be removed by ozone microbubbles.

Original languageEnglish
Pages (from-to)623-627
Number of pages5
JournalJournal of Photopolymer Science and Technology
Volume29
Issue number4
DOIs
Publication statusPublished - 2016 Jan 1
Externally publishedYes

Keywords

  • Environmentally friendly cleaning technique
  • Microbubble
  • Ozone
  • Resist removal

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Effect of temperature on degradation of polymers for photoresist using ozone microbubbles'. Together they form a unique fingerprint.

  • Cite this