TY - JOUR
T1 - Effect of temperature on degradation of polymers for photoresist using ozone microbubbles
AU - Matsuura, Kohei
AU - Nishiyama, Takashi
AU - Sato, Eriko
AU - Yamamoto, Masashi
AU - Kamimura, Tomosumi
AU - Takahashi, Masayoshi
AU - Koike, Kunihiko
AU - Horibe, Hideo
PY - 2016/1/1
Y1 - 2016/1/1
N2 - We studied about an effect of temperature on degradation of polymers for photoresist using ozone microbubbles as an environmentally friendly cleaning technique. The dissolved ozone concentration of ozone microbubbles was decreased with the increasing temperature because the solubility of ozone gas was decreased and self-decomposition of ozone in water was promoted. While, the reactivity between ozone and novolak resin was increased with the increasing temperature. Consequently, novolak resin was most efficiently removed at around 23 ºC. The activated energy for removal of novolak resin using ozone microbubbles was 23 kJ/mol determined from Arrhenius plots. Polyvinyl phenol was removed by ozone microbubbles, and its removal rate was comparable with that of novolak resin. Polymethyl methacrylate without C=C bond or benzene ring structure could not be removed by ozone microbubbles.
AB - We studied about an effect of temperature on degradation of polymers for photoresist using ozone microbubbles as an environmentally friendly cleaning technique. The dissolved ozone concentration of ozone microbubbles was decreased with the increasing temperature because the solubility of ozone gas was decreased and self-decomposition of ozone in water was promoted. While, the reactivity between ozone and novolak resin was increased with the increasing temperature. Consequently, novolak resin was most efficiently removed at around 23 ºC. The activated energy for removal of novolak resin using ozone microbubbles was 23 kJ/mol determined from Arrhenius plots. Polyvinyl phenol was removed by ozone microbubbles, and its removal rate was comparable with that of novolak resin. Polymethyl methacrylate without C=C bond or benzene ring structure could not be removed by ozone microbubbles.
KW - Environmentally friendly cleaning technique
KW - Microbubble
KW - Ozone
KW - Resist removal
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U2 - 10.2494/photopolymer.29.623
DO - 10.2494/photopolymer.29.623
M3 - Article
AN - SCOPUS:84985036730
VL - 29
SP - 623
EP - 627
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
SN - 0914-9244
IS - 4
ER -