Effect of synchrotron radiation on electrical characteristics of SiO xNy thin films formed by rapid thermal processing in a N2O ambient

Tomiyuki Arakawa, Yoshio Yamashita, Hiroshi Hoga, Shuichi Noda, Hisashi Fukuda

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Effect of synchrotron radiation on electrical characteristics of SiO xNy thin films formed by rapid thermal processing in a N2O ambient'. Together they form a unique fingerprint.

Physics & Astronomy