Effect of synchrotron radiation on electrical characteristics of SiO xNy thin films formed by rapid thermal processing in a N2O ambient

Tomiyuki Arakawa, Yoshio Yamashita, Hiroshi Hoga, Shuichi Noda, Hisashi Fukuda

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

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Physics & Astronomy