Effect of surface free energy of underlayer materials on crystal growth of Co polycrystalline films

O. Kitakami, S. Okamoto, Y. Shimada

Research output: Contribution to journalArticlepeer-review

32 Citations (Scopus)

Abstract

Crystallographic texture of polycrystalline Co films prepared by sputtering on a variety of underlayers has been investigated. The texture of polycrystalline Co films greatly depends on underlayer material, and this dependence is well explained by taking into account the surface free energy difference between the underlayer material (γu) and Co (γCo). When γu is larger than γCo, Co films can be grown with a well-defined Crystallographic texture of hcp-Co(001), which is the lowest surface energy crystal plane in order to minimize the total surface energy. In contrast, if γu is much smaller than γCo, no remarkable underlayer effects can be observed in the Crystallographic structure of Co films.

Original languageEnglish
Pages (from-to)6880-6883
Number of pages4
JournalJournal of Applied Physics
Volume79
Issue number9
DOIs
Publication statusPublished - 1996 May 1

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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