Effect of substrate temperature control during deposition on the adherence of ion-plated titanium carbide and vanadium carbide films on molybdenum

Masao Fukutomi, Masakazu Fujitsuka, Masahiro Kitajima, Tatsuo Shikama, Masatoshi Okada

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Molybdenum has been proposed as a material for protective or liner plates of fusion reactor first wall components. To avoid the introduction of high Z impurities such as molybdenum into the plasma, low Z coatings for the molybdenum are required. We investigated controlled heating of the substrate during deposition in an attempt to obtain strong adhesion across a film-substrate boundary. Using acetylene gas as the carbon source titanium carbide was ion plated onto the molybdenum substrate, whose temperature was increased at a rate of 40-80°C min-1 and finally maintained at 800°C or more until the end of the coating process. Coatings about 25 μm in thickness obtained by this method were thermally cycled 100 times with an IR image furnace between 200-1200°C at a heating rate of 100°C s-1; no evidence of adhesion failure was obtained. Vanadium carbide coatings also showed good resistance against film exfoliation, although microcracks were observed after the thermal cycle test.

Original languageEnglish
Pages (from-to)271-277
Number of pages7
JournalThin Solid Films
Volume80
Issue number1-3
DOIs
Publication statusPublished - 1981 Jun 19

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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