Effect of stress on tertiary recrystallized silicon iron

Akihiko Saito, Ken ichi Yamamoto, Kazushi Ishiyama, Ken ichi Arai

Research output: Contribution to journalArticlepeer-review

Abstract

The effects of stress on the magnetization change for tertiary recrystallized silicon iron has been investigated. The processes of magnetization change due to tensile stress at various points on the hysteresis curve have been made clear. This material has an extremely small volume portion of 90° domains compared with high-grade commercial grain-oriented silicon iron sheet.

Original languageEnglish
Pages (from-to)229-231
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Volume112
Issue number1-3
DOIs
Publication statusPublished - 1992 Jul 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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