Effect of SR irradiation on crystallization of amorphous tin oxide film

Y. Kimura, T. Kobayashi, K. Hanamoto, M. Sasaki, S. Kimura, T. Nakada, Y. Nakayama, C. Kaito

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

In order to see the effect of SR irradiation on crystal growth, crystallization of tin oxide films has been performed in vacuum under SR irradiation. A thin amorphous tin oxide film 50 nm thick was prepared on the carbon substrate by vacuum evaporation of SnO2 power. A SnO crystal appeared between 450-500°C upon vacuum heating, with a preferred orientation of (001). By SR irradiation using a cylindrical mirror for 20s, the SnO crystal appeared with the preferred orientation of (111). The crystal with the crystallographic shear structure was grown by SR irradiation. This growth under a SR beam is discussed in terms of SR beam excitation of lone-pair electrons seen in the SnO crystal structure.

Original languageEnglish
Pages (from-to)1221-1224
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume467-468
Issue numberPART II
DOIs
Publication statusPublished - 2001 Dec 1

Keywords

  • Amorphous thin film
  • Crystallization
  • Crystallographic shear
  • Irradiation

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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