Effect of relaxation time on dis-continuous passivation film

H. Nanjo, K. Sajiki, N. Hoshi, F. M.B. Hassan, S. Venkatachalam, M. Kanakubo, T. Aida, Y. Suzuki, J. Onagawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The cycle of short time passivation and the following weak reduction was repeated and oxidation film of a few atomic layers were formed and relaxed for a designed time at each cycle. In other wards, passive film was generated by dis-continuous passivation method such as layer-by-layer fabrication in a sub-nanometer scale. Then atomically flat surface was fabricated on the dis-continuous passivation film.

Original languageEnglish
Title of host publicationNanotechnology (General) - 216th ECS Meeting
Pages113-119
Number of pages7
Edition24
DOIs
Publication statusPublished - 2010 Dec 1
Externally publishedYes
EventNanotechnology General Session - 216th ECS Meeting - Vienna, Austria
Duration: 2009 Oct 42009 Oct 9

Publication series

NameECS Transactions
Number24
Volume25
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

ConferenceNanotechnology General Session - 216th ECS Meeting
CountryAustria
CityVienna
Period09/10/409/10/9

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Nanjo, H., Sajiki, K., Hoshi, N., Hassan, F. M. B., Venkatachalam, S., Kanakubo, M., Aida, T., Suzuki, Y., & Onagawa, J. (2010). Effect of relaxation time on dis-continuous passivation film. In Nanotechnology (General) - 216th ECS Meeting (24 ed., pp. 113-119). (ECS Transactions; Vol. 25, No. 24). https://doi.org/10.1149/1.3316119