Effect of NH3 on the preparation of TiNx films by laser CVD using tetrakis-diethylamido-titanium

Yansheng Gong, Rong Tu, Takashi Goto

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10 Citations (Scopus)


Titanium nitride (TiNx) films were prepared by laser chemical vapor deposition (LCVD) with tetrakis-diethylamido-titanium (TDEAT) and NH3 as the source materials. The effects of the fraction of ammonia (FN H3) on the microstructure, preferred orientation and deposition rate were investigated. Non-oriented TiNx films with a cauliflower-like texture were obtained without NH3, whereas (1 1 1), (2 0 0) and (2 2 0) preferred TiNx films in a single phase with facetted and square textures were obtained with NH3 gas. The lattice parameter decreased slightly with increasing FN H3. The deposition rate (Rdep) of TiNx films with a deposition area of about 300 mm2 increased with increasing FN H3, and attained the highest value of 90 μm h-1 at FN H3 = 0.5, laser power (PL) = 100 W and deposition temperature (Tdep) = 597 °C.

Original languageEnglish
Pages (from-to)451-455
Number of pages5
JournalJournal of Alloys and Compounds
Issue number1-2
Publication statusPublished - 2009 Oct 19
Externally publishedYes


  • LCVD
  • Microstructure
  • Preferred orientation
  • TiN films

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry


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