Effect of NH₃ on the preparation of TiN_x films by laser CVD using tetrakis-diethylamido-titanium

Titanium nitride (TiN_x) films were prepared by laser chemical vapor deposition (LCVD) with tetrakis-diethylamido-titanium (TDEAT) and NH₃ as the source materials. The effects of the fraction of ammonia (F_{N H3}) on the microstructure, preferred orientation and deposition rate were investigated. Non-oriented TiN_x films with a cauliflower-like texture were obtained without NH₃, whereas (1 1 1), (2 0 0) and (2 2 0) preferred TiN_x films in a single phase with facetted and square textures were obtained with NH₃ gas. The lattice parameter decreased slightly with increasing F_{N H3}. The deposition rate (R_dep) of TiN_x films with a deposition area of about 300 mm² increased with increasing F_{N H3}, and attained the highest value of 90 μm h^-1 at F_{N H3} = 0.5, laser power (P_L) = 100 W and deposition temperature (T_dep) = 597 °C.