Abstract
Titanium nitride (TiNx) films were prepared by laser chemical vapor deposition (LCVD) with tetrakis-diethylamido-titanium (TDEAT) and NH3 as the source materials. The effects of the fraction of ammonia (FN H3) on the microstructure, preferred orientation and deposition rate were investigated. Non-oriented TiNx films with a cauliflower-like texture were obtained without NH3, whereas (1 1 1), (2 0 0) and (2 2 0) preferred TiNx films in a single phase with facetted and square textures were obtained with NH3 gas. The lattice parameter decreased slightly with increasing FN H3. The deposition rate (Rdep) of TiNx films with a deposition area of about 300 mm2 increased with increasing FN H3, and attained the highest value of 90 μm h-1 at FN H3 = 0.5, laser power (PL) = 100 W and deposition temperature (Tdep) = 597 °C.
Original language | English |
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Pages (from-to) | 451-455 |
Number of pages | 5 |
Journal | Journal of Alloys and Compounds |
Volume | 485 |
Issue number | 1-2 |
DOIs | |
Publication status | Published - 2009 Oct 19 |
Externally published | Yes |
Keywords
- LCVD
- Microstructure
- Preferred orientation
- TDEAT
- TiN films
ASJC Scopus subject areas
- Mechanics of Materials
- Mechanical Engineering
- Metals and Alloys
- Materials Chemistry