Effect of neutral beam etching on mechanical property of microcantilevers

Yuki Nishimori, Shinji Ueki, Kazuhiro Miwa, Tomohiro Kubota, Masakazu Sugiyama, Seiji Samukawa, Gen Hashiguchi

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

As an effective application of neutral beam etching (NBE) to microelectromechanical systems (MEMS), here we propose a combination of conventional plasma processes and NBE to remove plasma-induced damage. To evaluate the effect of the combined approach quantitatively, we measured the resonance properties of a microcantilever before and after NBE treatment and compared them with a characteristic quantity. The thickness of the damage layer times the imaginary part of the complex Youngs modulus (δEds), which is a parameter of surface damage. Although a plasma process makes the damaged surface of the microcantilevers during their fabrication, the removal of that damage by NBE is confirmed as a reduction in δEds. NBE can provide a damage-free surface for MEMS devices without a high-temperature annealing process.

Original languageEnglish
Article number022001
JournalJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Volume31
Issue number2
DOIs
Publication statusPublished - 2013 Mar

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

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