Effect of Li addition on the formation of Na-β/βʹʹ-alumina film by laser chemical vapor deposition

Chen Chi, Hirokazu Katsui, Takashi Goto

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Films composed of a mixture of Na-β- and βʹʹ aluminas (β/βʹʹ-alumina) were prepared via laser chemical vapor deposition (CVD) upon the addition of Li. The effect of the Li source gas on the phase formation, microstructure and deposition rates of the β/βʹʹ-alumina films was investigated. The Na-β/βʹʹ-alumina films were formed at a Li/Al precursor supply ratio (RLi/Al) of 0.1–1.0 within a deposition temperature (Tdep) range of 1100–1220 K. The Na-β/βʹʹ-alumina phase was exclusively formed at Tdep=1165–1185 K and RLi/Al=0.1–0.5, whereas α-Al2O3 (with minor amounts of LiAlO2 and LiAl5O8) was predominantly observed at Tdep>1223 K and RLi/Al >1.0. The Na-β/βʹʹ-alumina films were composed of polygonal facets in sizes of several hundred nanometers with a columnar cross section. The deposition rate of the Na-β/βʹʹ-alumina film was 60 µm h−1.

Original languageEnglish
Pages (from-to)1278-1283
Number of pages6
JournalCeramics International
Volume43
Issue number1
DOIs
Publication statusPublished - 2017 Jan 1

Keywords

  • Beta-alumina
  • Laser chemical vapor deposition
  • Low deposition temperature
  • Microstructure
  • Stabilization

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry

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