Abstract
Films composed of a mixture of Na-β- and βʹʹ aluminas (β/βʹʹ-alumina) were prepared via laser chemical vapor deposition (CVD) upon the addition of Li. The effect of the Li source gas on the phase formation, microstructure and deposition rates of the β/βʹʹ-alumina films was investigated. The Na-β/βʹʹ-alumina films were formed at a Li/Al precursor supply ratio (RLi/Al) of 0.1–1.0 within a deposition temperature (Tdep) range of 1100–1220 K. The Na-β/βʹʹ-alumina phase was exclusively formed at Tdep=1165–1185 K and RLi/Al=0.1–0.5, whereas α-Al2O3 (with minor amounts of LiAlO2 and LiAl5O8) was predominantly observed at Tdep>1223 K and RLi/Al >1.0. The Na-β/βʹʹ-alumina films were composed of polygonal facets in sizes of several hundred nanometers with a columnar cross section. The deposition rate of the Na-β/βʹʹ-alumina film was 60 µm h−1.
| Original language | English |
|---|---|
| Pages (from-to) | 1278-1283 |
| Number of pages | 6 |
| Journal | Ceramics International |
| Volume | 43 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2017 Jan 1 |
Keywords
- Beta-alumina
- Laser chemical vapor deposition
- Low deposition temperature
- Microstructure
- Stabilization
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Ceramics and Composites
- Process Chemistry and Technology
- Surfaces, Coatings and Films
- Materials Chemistry