Abstract
Rutile and anatase TiO2 films were prepared by laser chemical vapor deposition using CO2 and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO2 films were investigated. Using a CO2 laser, single-phase rutile TiO2 films were obtained at 826-1225K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83μmh-1 at 1070K. Using a Nd:YAG laser, the phase of the TiO2 films changed from rutile to anatase with increasing deposition temperature from 852 to 1230K. The rutile TiO2 films showed a (100) orientation with a columnar structure, while the anatase TiO2 films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO2 films were 142 and 40μmh-1, respectively.
Original language | English |
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Pages (from-to) | 166-172 |
Number of pages | 7 |
Journal | Surface and Coatings Technology |
Volume | 244 |
DOIs | |
Publication status | Published - 2014 Apr 15 |
Keywords
- Anatase
- Laser CVD
- Rutile
- Thick film
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry