Effect of laser wavelength on phase and microstructure of TiO2 films prepared by laser chemical vapor deposition

Ming Gao; Akihiko Ito; Takashi Goto

doi:10.1016/j.surfcoat.2014.02.003

Effect of laser wavelength on phase and microstructure of TiO₂ films prepared by laser chemical vapor deposition

Ming Gao, Akihiko Ito, Takashi Goto

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

Rutile and anatase TiO₂ films were prepared by laser chemical vapor deposition using CO₂ and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO₂ films were investigated. Using a CO₂ laser, single-phase rutile TiO₂ films were obtained at 826-1225K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83μmh^-1 at 1070K. Using a Nd:YAG laser, the phase of the TiO₂ films changed from rutile to anatase with increasing deposition temperature from 852 to 1230K. The rutile TiO₂ films showed a (100) orientation with a columnar structure, while the anatase TiO₂ films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO₂ films were 142 and 40μmh^-1, respectively.

Original language	English
Pages (from-to)	166-172
Number of pages	7
Journal	Surface and Coatings Technology
Volume	244
DOIs	https://doi.org/10.1016/j.surfcoat.2014.02.003
Publication status	Published - 2014 Apr 15

Keywords

Anatase
Laser CVD
Rutile
Thick film

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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title = "Effect of laser wavelength on phase and microstructure of TiO2 films prepared by laser chemical vapor deposition",

abstract = "Rutile and anatase TiO2 films were prepared by laser chemical vapor deposition using CO2 and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO2 films were investigated. Using a CO2 laser, single-phase rutile TiO2 films were obtained at 826-1225K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83μmh-1 at 1070K. Using a Nd:YAG laser, the phase of the TiO2 films changed from rutile to anatase with increasing deposition temperature from 852 to 1230K. The rutile TiO2 films showed a (100) orientation with a columnar structure, while the anatase TiO2 films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO2 films were 142 and 40μmh-1, respectively.",

keywords = "Anatase, Laser CVD, Rutile, Thick film",

author = "Ming Gao and Akihiko Ito and Takashi Goto",

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T1 - Effect of laser wavelength on phase and microstructure of TiO2 films prepared by laser chemical vapor deposition

AU - Gao, Ming

AU - Ito, Akihiko

AU - Goto, Takashi

PY - 2014/4/15

Y1 - 2014/4/15

N2 - Rutile and anatase TiO2 films were prepared by laser chemical vapor deposition using CO2 and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO2 films were investigated. Using a CO2 laser, single-phase rutile TiO2 films were obtained at 826-1225K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83μmh-1 at 1070K. Using a Nd:YAG laser, the phase of the TiO2 films changed from rutile to anatase with increasing deposition temperature from 852 to 1230K. The rutile TiO2 films showed a (100) orientation with a columnar structure, while the anatase TiO2 films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO2 films were 142 and 40μmh-1, respectively.

AB - Rutile and anatase TiO2 films were prepared by laser chemical vapor deposition using CO2 and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO2 films were investigated. Using a CO2 laser, single-phase rutile TiO2 films were obtained at 826-1225K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83μmh-1 at 1070K. Using a Nd:YAG laser, the phase of the TiO2 films changed from rutile to anatase with increasing deposition temperature from 852 to 1230K. The rutile TiO2 films showed a (100) orientation with a columnar structure, while the anatase TiO2 films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO2 films were 142 and 40μmh-1, respectively.

KW - Anatase

KW - Laser CVD

KW - Rutile

KW - Thick film

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