Effect of laser power on orientation and microstructure of TiO2 films prepared by laser chemical vapor deposition method

Dongyun Guo, Akihiko Ito, Takashi Goto, Rong Tu, Chuanbin Wang, Qiang Shen, Lianmeng Zhang

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

Abstract

The TiO2 films were prepared on Pt/Ti/SiO2/Si substrate by a laser chemical vapor deposition method. With increasing laser power (PL) from 48 to 98 W, the deposition temperature (T dep) monotonously increased from 849 to 929 K. At Tdep=849 K (PL=48 W), the rutile TiO2 film was prepared with strong (110) and (200) peaks. With increasing Tdep from 849 to 883 K (PL=71 W), the intensity of (110) peak increased. The (110)-oriented TiO2 films were obtained for Tdep beyond 903 K (P L=81 W). All TiO2 films showed faceted grains with the columnar cross-section. With increasing Tdep, the grain size increased and the column became wider. The high deposition rate (R dep) ranged from 13.04 to 24.84 μm h-1.

Original languageEnglish
Pages (from-to)179-182
Number of pages4
JournalMaterials Letters
Volume93
DOIs
Publication statusPublished - 2013

Keywords

  • Laser chemical vapor deposition
  • Laser power
  • Microstructure
  • Orientation
  • TiO film

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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