Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process

K. Yagami; M. Tsunoda; S. Sugano; M. Takahashi

doi:10.1109/intmag.1999.837518

Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process

K. Yagami, M. Tsunoda, S. Sugano, M. Takahashi

Research output: Contribution to journal › Conference article › peer-review

Abstract

In this study, the effect of the Ir content and sputtering conditions of Mn-Ir layers on the strength of exchange anisotropy was investigated in Ni-Fe/Mn-Ir layers fabricated under the extremely clean sputtering process. It was found that for as-deposited films, the unidirectional anisotropy constant J_K monotonously increases with increasing the Ir content and decreasing the deposition rate.

Original language	English
Pages (from-to)	DS-04
Journal	Digests of the Intermag Conference
DOIs	https://doi.org/10.1109/intmag.1999.837518
Publication status	Published - 1999
Externally published	Yes
Event	Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' - Kyongju, South Korea Duration: 1999 May 18 → 1999 May 21

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1109/intmag.1999.837518

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title = "Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process",

abstract = "In this study, the effect of the Ir content and sputtering conditions of Mn-Ir layers on the strength of exchange anisotropy was investigated in Ni-Fe/Mn-Ir layers fabricated under the extremely clean sputtering process. It was found that for as-deposited films, the unidirectional anisotropy constant JK monotonously increases with increasing the Ir content and decreasing the deposition rate.",

author = "K. Yagami and M. Tsunoda and S. Sugano and M. Takahashi",

year = "1999",

doi = "10.1109/intmag.1999.837518",

language = "English",

pages = "DS--04",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' ; Conference date: 18-05-1999 Through 21-05-1999",

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T1 - Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process

AU - Yagami, K.

AU - Tsunoda, M.

AU - Sugano, S.

AU - Takahashi, M.

PY - 1999

Y1 - 1999

N2 - In this study, the effect of the Ir content and sputtering conditions of Mn-Ir layers on the strength of exchange anisotropy was investigated in Ni-Fe/Mn-Ir layers fabricated under the extremely clean sputtering process. It was found that for as-deposited films, the unidirectional anisotropy constant JK monotonously increases with increasing the Ir content and decreasing the deposition rate.

AB - In this study, the effect of the Ir content and sputtering conditions of Mn-Ir layers on the strength of exchange anisotropy was investigated in Ni-Fe/Mn-Ir layers fabricated under the extremely clean sputtering process. It was found that for as-deposited films, the unidirectional anisotropy constant JK monotonously increases with increasing the Ir content and decreasing the deposition rate.

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DO - 10.1109/intmag.1999.837518

M3 - Conference article

AN - SCOPUS:0033298321

SN - 0074-6843

SP - DS-04

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

T2 - Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99'

Y2 - 18 May 1999 through 21 May 1999

ER -

Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process

Abstract

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