Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process

K. Yagami, M. Tsunoda, S. Sugano, M. Takahashi

Research output: Contribution to journalConference articlepeer-review

Abstract

In this study, the effect of the Ir content and sputtering conditions of Mn-Ir layers on the strength of exchange anisotropy was investigated in Ni-Fe/Mn-Ir layers fabricated under the extremely clean sputtering process. It was found that for as-deposited films, the unidirectional anisotropy constant JK monotonously increases with increasing the Ir content and decreasing the deposition rate.

Original languageEnglish
Pages (from-to)DS-04
JournalDigests of the Intermag Conference
Publication statusPublished - 1999 Dec 1
Externally publishedYes
EventProceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' - Kyongju, South Korea
Duration: 1999 May 181999 May 21

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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