Effect of ir content and sputtering conditions on unidirectional anisotropy of ni-fe/mn-ir films fabricated under the extremely clean sputtering process

Kojiro Yagami, Masakiyo Tsunoda, Satoshi Sugano, Migaku Takahashi

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

An effect of the Ir content and sputtering conditions of Mn-Ir films on the strength of exchange anisotropy was investigated in Ni-Fe/Mn-Ir layers fabricated under the extremely clean sputtering process. We found that the unidirectional anisotropy constant 7K monotonously increased with increasing the Ir content and decreasing the deposition rote of Mn-Ir films. The change of JK against the deposition rate of Mn-Ir films is possibly caused by the quite slight changes of the mlcrostrocture of Mn-Ir films, which were undetectable with XRD.

Original languageEnglish
Pages (from-to)3919-3921
Number of pages3
JournalIEEE Transactions on Magnetics
Volume35
Issue number5 PART 2
DOIs
Publication statusPublished - 1999 Dec 1
Externally publishedYes

Keywords

  • Exchange anlsotropy
  • Extremely clean sputtering
  • Ir content
  • Mn-ir
  • Sputtering conditions

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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