An effect of the Ir content and sputtering conditions of Mn-Ir films on the strength of exchange anisotropy was investigated in Ni-Fe/Mn-Ir layers fabricated under the extremely clean sputtering process. We found that the unidirectional anisotropy constant 7K monotonously increased with increasing the Ir content and decreasing the deposition rote of Mn-Ir films. The change of JK against the deposition rate of Mn-Ir films is possibly caused by the quite slight changes of the mlcrostrocture of Mn-Ir films, which were undetectable with XRD.
- Exchange anlsotropy
- Extremely clean sputtering
- Ir content
- Sputtering conditions
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering