Effect of ion implantation layer on adhesion of DLC film by plasma-based ion implantation and deposition

Y. Oka, Masahiko Nishijima, K. Hiraga, M. Yatsuzuka

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

High adhesive diamond-like carbon (DLC) film on SUS304 was obtained using carbon ion implantation between DLC film and substrate material by plasma-based ion implantation and deposition (PBIID). Implantation of mixed silicon and carbon ions to the substrate resulted in much higher adhesion strength than that of the epoxy resin. Effect of ion implantation on adhesion of DLC film was studied by cross sectional STEM observation and EDS element analysis. Enhancement in adhesive strength by ion implantation of mixed carbon and silicon was ascribed to the formation of the multilayer interface consisting of mixed carbon and silicon ion implanted layer and the amorphous layer of carbon and silicon.

Original languageEnglish
Pages (from-to)6647-6650
Number of pages4
JournalSurface and Coatings Technology
Volume201
Issue number15
DOIs
Publication statusPublished - 2007 Apr 23

Keywords

  • Adhesive strength
  • DLC
  • EDS
  • PBIID
  • STEM

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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