Effect of ion-beam etching damage in Fe-Co tapered main pole

Yuichi Ohsawa; Kiyoshi Yamakawa; Hiroaki Muraoka

doi:10.1063/1.3070584

Effect of ion-beam etching damage in Fe-Co tapered main pole

Yuichi Ohsawa, Kiyoshi Yamakawa, Hiroaki Muraoka

Broadband Engineering Division

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Effect of ion-beam etching damage in Fe-Co films was estimated and magnetic calculation of the planar head using tapered main pole (MP) including the etching damage was performed. The etching test on the Fe-Co films, whose thickness corresponds to half of the trackwidth for several Tbits/in.2, showed decrease in saturation magnetic flux density (Bs) and increase in coercivity with a 250 eV ion beam. The magnetic calculation showed relatively large decrease in head field and head field gradient as Bs of the damaged region decreases from 2.4 T. Damage control in the MP fabrication is one of the important issues for Tbits/in.2 -era write heads.

Original language	English
Article number	07B727
Journal	Journal of Applied Physics
Volume	105
Issue number	7
DOIs	https://doi.org/10.1063/1.3070584
Publication status	Published - 2009 Apr 27

ASJC Scopus subject areas

Physics and Astronomy(all)

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abstract = "Effect of ion-beam etching damage in Fe-Co films was estimated and magnetic calculation of the planar head using tapered main pole (MP) including the etching damage was performed. The etching test on the Fe-Co films, whose thickness corresponds to half of the trackwidth for several Tbits/in.2, showed decrease in saturation magnetic flux density (Bs) and increase in coercivity with a 250 eV ion beam. The magnetic calculation showed relatively large decrease in head field and head field gradient as Bs of the damaged region decreases from 2.4 T. Damage control in the MP fabrication is one of the important issues for Tbits/in.2 -era write heads.",

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N2 - Effect of ion-beam etching damage in Fe-Co films was estimated and magnetic calculation of the planar head using tapered main pole (MP) including the etching damage was performed. The etching test on the Fe-Co films, whose thickness corresponds to half of the trackwidth for several Tbits/in.2, showed decrease in saturation magnetic flux density (Bs) and increase in coercivity with a 250 eV ion beam. The magnetic calculation showed relatively large decrease in head field and head field gradient as Bs of the damaged region decreases from 2.4 T. Damage control in the MP fabrication is one of the important issues for Tbits/in.2 -era write heads.

AB - Effect of ion-beam etching damage in Fe-Co films was estimated and magnetic calculation of the planar head using tapered main pole (MP) including the etching damage was performed. The etching test on the Fe-Co films, whose thickness corresponds to half of the trackwidth for several Tbits/in.2, showed decrease in saturation magnetic flux density (Bs) and increase in coercivity with a 250 eV ion beam. The magnetic calculation showed relatively large decrease in head field and head field gradient as Bs of the damaged region decreases from 2.4 T. Damage control in the MP fabrication is one of the important issues for Tbits/in.2 -era write heads.

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