Effect of iodotrifluoromethane plasma for reducing ultraviolet light irradiation damage in dielectric film etching processes

Yoshinari Ichihashi, Yasushi Ishikawa, Ryu Shimizu, Seiji Samukawa

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy