Effect of electron temperature on the DLC film properties

Noriaki Ikenaga, Kaoru Awazu, Noriyuki Sakudo, Haruyuki Yasui, Takeshi Kawabata

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)


It is well known that diamond-like carbon (DLC) films made by plasma chemical vapor deposition (CVD) have such excellent tribological characteristics that the lifetimes of machine tools and dies are considerably improved when the films are deposited on them. However, the application field has been somewhat restricted since the film-property control has been a little more difficult than other hard coatings like TiN and TiAlN. In this paper, we try to find out the key factors that control the film properties, from the viewpoint of plasma chemistry. The electron-density distribution in plasma is measured with a Langmuir probe while DLC films are formed on the specimen surfaces of both silicon and tungsten carbide (WC). Hardness and scratch tests are carried out to evaluate the mechanical characteristics of the films. The solid-state structures are investigated by Raman spectroscopy. As a result, it is shown that the electron temperature of plasma strongly affects the film properties such as friction, wear and hardness.

Original languageEnglish
Pages (from-to)226-230
Number of pages5
JournalSurface and Coatings Technology
Issue number1-3 SPEC. ISS.
Publication statusPublished - 2005 Jun 22
Externally publishedYes


  • Amorphous
  • DLC film
  • Electron temperature
  • Hardness
  • Hydrogen
  • PBII
  • Plasma source ion implantation
  • TRIM

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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