Effect of electron energy distribution functions on plasma generated vacuum ultraviolet in a diffusion plasma excited by a microwave surface wave

J. P. Zhao, L. Chen, M. Funk, R. Sundararajan, T. Nozawa, S. Samukawa

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Plasma generated vacuum ultraviolet (VUV) in diffusion plasma excited by a microwave surface wave has been studied by using dielectric-based VUV sensors. Evolution of plasma VUV in the diffusion plasma as a function of the distance from the power coupling surface is investigated. Experimental results have indicated that the energy and spatial distributions of plasma VUV are mainly controlled by the energy distribution functions of the plasma electrons, i.e., electron energy distribution functions (EEDFs). The study implies that by designing EEDF of plasma, one could be able to tailor plasma VUV in different applications such as in dielectric etching or photo resist smoothing.

Original languageEnglish
Article number032103
JournalApplied Physics Letters
Volume103
Issue number3
DOIs
Publication statusPublished - 2013 Jul 15

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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