Plasma generated vacuum ultraviolet (VUV) in diffusion plasma excited by a microwave surface wave has been studied by using dielectric-based VUV sensors. Evolution of plasma VUV in the diffusion plasma as a function of the distance from the power coupling surface is investigated. Experimental results have indicated that the energy and spatial distributions of plasma VUV are mainly controlled by the energy distribution functions of the plasma electrons, i.e., electron energy distribution functions (EEDFs). The study implies that by designing EEDF of plasma, one could be able to tailor plasma VUV in different applications such as in dielectric etching or photo resist smoothing.
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)