Effect of dissolved oxygen on etching process of Si(111) in 2.5% NH3 solution

Hirokazu Fukidome, Michio Matsumura

Research output: Contribution to journalArticle

21 Citations (Scopus)

Fingerprint Dive into the research topics of 'Effect of dissolved oxygen on etching process of Si(111) in 2.5% NH<sub>3</sub> solution'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy