Effect of deposition temperature on the characteristics of hafnium oxide films deposited by metalorganic chemical vapor deposition using amide precursor

Kenji Takahashi, Hiroshi Funakubo, Shiro Hino, Makoto Nakayama, Naoki Ohashi, Takanori Kiguchi, Eisuke Tokumitsu

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11 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy

Chemical Compounds