Effect of composition ratio on erbium silicide work function on different morphology of Si(100) surface changed by alkaline etching

Hiroaki Tanaka, Tomoyuki Suwa, Akinobu Teramoto, Tsukasa Motoya, Shigetoshi Sugawa, Tadahiro Ohmi

Research output: Contribution to journalConference articlepeer-review

Abstract

Electrical and physical properties of ErSix on n-type Si(100) surfaces with an alkaline solution etching are investigated. The (111) facet of Si surface affects the Schottky barrier height (SBH) between ErSix and n-type Si, because the SBH depends on the surface orientation of Si. The orientation of the surface is a key parameter for reducing contact resistance for high performance MISFETs. These silicidation reactions are very important to develop the high current drivability devices.

Original languageEnglish
Pages (from-to)47-53
Number of pages7
JournalECS Transactions
Volume61
Issue number3
DOIs
Publication statusPublished - 2014
EventInternational Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 4 - 225th ECS Meeting - Orlando, United States
Duration: 2014 May 112014 May 15

ASJC Scopus subject areas

  • Engineering(all)

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