Effect of chemical preoxidation treatment on the structure of SiO 2 /Si interfaces

Hiroshi Nohira, Hiroaki Sekikawa, Masanori Matsuda, Takeo Hattori

    Research output: Contribution to journalArticlepeer-review

    5 Citations (Scopus)

    Abstract

    The effects of chemical preoxidation treatments on the oxidation reaction at SiO 2 /Si(111) interfaces were investigated using XPS. In the case of preoxidation treatment in a mixed solution of H 2 SO 4 and H 2 O 2 the layer-by-layer oxidation reaction occurs at the interface as in the case of the preoxidation treatment in dry oxygen at 300°C. The effect of chemical preoxidation treatment in a hot solution of HNO 3 and that in a mixed solution of HCl and H 2 O 2 on the oxidation reaction at the interface were also investigated.

    Original languageEnglish
    Pages (from-to)359-363
    Number of pages5
    JournalApplied Surface Science
    Volume104-105
    DOIs
    Publication statusPublished - 1996 Sep

    ASJC Scopus subject areas

    • Chemistry(all)
    • Condensed Matter Physics
    • Physics and Astronomy(all)
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films

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