Effect of bias sputtering condition on structure of LaNi5 films

Kenta Nakakado, Makoto Ohtsuka, Yusuke Ayame, Kimio Itagaki

Research output: Contribution to journalArticlepeer-review

Abstract

Purification of hydrogen using a hydrogen storage alloy film has various advantages such as low operation energy and low costs of the equipment. However, because of the surface roughness of a substrate, the surface of the sputtered film was not smooth and had some pinholes. It was considered that use of a bias sputtering method might solve these problems. Hence, in this study, the influence of the bias power on the composition, microstructure and crystal structure of the LaNi5 sputtered film were investigated. When the film was deposited with a direct current sputter power WS = 50 W and a radio frequency bias power WB = 20 W, the diffraction peak of LaNi5 was not observed on the film. With WS = 200 W and WB = 20 W, the film had crystal structures. However, when the W B was increased more than 40 W with WS = 200 W, the film became the amorphous structure. It is considered that, to make the amorphous structure and the dense film with higher WS, the WB has to be increased.

Original languageEnglish
Pages (from-to)832-835
Number of pages4
JournalMaterials Transactions
Volume48
Issue number4
DOIs
Publication statusPublished - 2007 Apr

Keywords

  • Amorphous structure
  • Bias sputtering method
  • Hydrogen permeable film
  • Hydrogen storage alloy
  • Lanthanum-nickel alloy

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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