Effect of Ar/Ar-H2 plasma arc melting on Cu purification

Jae Won Lim, Min Seuk Kim, N. R. Munirathnam, Minh Tung Le, Masahito Uchikoshi, Kouji Mimura, Minoru Isshiki, Hyuk Chon Kwon, Good Sun Choi

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

Removal of impurities from Cu metal by Ar and Ar-20%H2 plasma arc melting (PAM) has been carried out. Several impurities such as Li, Na, Mg, P, S, Cl, K, Ca, Zn, Pd, Pb and Bi in Cu were efficiently removed when only Ar plasma gas was used. Moreover, removal degrees for the above mentioned impurities were significantly increased after Ar-20%H2-PAM, especially for K, Zn and Pd. It was found that Ar-H2 PAM showed an excellent effect to eliminate impurities with higher vapor pressures than that of Cu metal.

Original languageEnglish
Pages (from-to)1826-1829
Number of pages4
JournalMaterials Transactions
Volume49
Issue number8
DOIs
Publication statusPublished - 2008 Aug

Keywords

  • Copper
  • Glow discharge mass spectrometry
  • Hydrogen
  • Impurity
  • Plasma arc melting

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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