Effect of applied stress on pitting corrosion behavior of type 304 stainless steel in chloride environment

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Electrochemical measurements with and without stress were conducted to clarify the effect of applied stress on pitting corrosion behavior. In potentiodynamic polarization, the increase of the chloride ion concentration led to the formation of shallower pits. In immersion tests with and without stress in the 4 M MgCl2 solution at pH 5, the pit was formed slightly earlier under applied stress. However, there is no or little effect of stress on the corrosion potential before and after the pit initiation. Furthermore, the pit morphology was changed by applied stress, suggesting applied stress causes the increases in anodic dissolution rate and depassivation pH. No remarkable difference in the anodic dissolution rate was observed in potentiodynamic polarization in 4 M MgCl2 solution at pH 1. Depassivation pHs measured in 4 M MgCl2 solution with and without stress were 1.4 and 1.3 in, respectively. Depassivation pH increased by applied stress.

Original languageEnglish
Title of host publicationECS Transactions
EditorsS. Bhansali, S. Brankovic, D. A. Buttry, D. Chu, H. Imahori, H. Katayama, O. Leonte, S. Mukerjee, R. Mukundan, Y. Oren, L. Romankiw, N. Sharma, A. Simonian, P. C. Trulove, J. T. Vaughey, M. Winter, P. N. Bartlett, V. Di Noto, M. Doeff, T. Druffel, J. M. Fenton, J. Fergus, Y. Fukunaka, M. Itagaki, J. Koehne, R. Kostecki, R. P. Lynch, I. Milosev, S. R. Narayan, V. Subramanian, T. Tatsuma, N. Wu, Z. Chen, L. M. Haverhals, P. Hesketh, A. C. Hillier, M. Inaba, G. Krumdick, J. Leddy, M. Manivannan, V. Maurice, S. Mitra, J. Muldoon, J. Noel, K. Rajeshwar, V. R. Subramanian, A. H. Suroviec, K. Suto, G. Zangari, P. Allongue, N. Birbilis, O. V. Boltalina, S. Calabrese Barton, V. Chaitanya, D. Chidambaram, J. K. Hite, J. J. Lee, R. A. Mantz, J. Mauzeroll, S. D. Minteer, M. E. Orazem, R. P. Ramasamy, D. P. Riemer, D. Roeper, M. Rohwerder, M. J. Sailor, D. T. Schwartz, J. A. Staser, G. Wu, H. Xu, R. Alkire, T. J. Anderson, M. Bayachou, A. B. Bocarsly, J. W. Choi, M. Innocenti, S. H. Kilgore, D. J. Kim, P. J. Kulesza, Y. C. Lu, P. Marcus, M. Mauter, J. D. Nicholas, S. Pylypenko, C. Rhodes, L. Soleymani, M. Tao, Y. Xing, A. P. Abbott, B. A. Chin, D. E. Cliffel, E. A. Douglas, K. Edstrom, H. Hamada, H. N. McMurray, Y. S. Meng, E. L. Miller, M. Navaei, S. S. Nonnenmann, C. O'Dwyer, P. Pharkya, S. V. Rotkin, J. L. M. Rupp, G. Williams, C. Bock, R. Buchheit, G. T. Cheek, H. Deligianni, C. Johnson, J. G. Park, P. N. Pintauro, K. C. Smith, P. Vanysek, H. Wang, J. F. Whitacre, J. Xiao, M. T. Carter, N. Dimitrov, J. Fransaer, D. Guyomard, B. L. Lucht, L. Nagahara, P. M. Natishan, P. K. Sekhar, D. K. Smith, G. R. Stafford, K. B. Sundaram, N. Vasiljevic, S. Virtanen, W. Wang, D. L. Wood, J. J. Yang
PublisherElectrochemical Society Inc.
Pages1407-1413
Number of pages7
Edition10
ISBN (Electronic)9781607685395
DOIs
Publication statusPublished - 2017 Jan 1
Event232nd ECS Meeting - National Harbor, United States
Duration: 2017 Oct 12017 Oct 5

Publication series

NameECS Transactions
Number10
Volume80
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Other

Other232nd ECS Meeting
CountryUnited States
CityNational Harbor
Period17/10/117/10/5

ASJC Scopus subject areas

  • Engineering(all)

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    Tokuda, S., Muto, I., Sugawara, Y., & Hara, N. (2017). Effect of applied stress on pitting corrosion behavior of type 304 stainless steel in chloride environment. In S. Bhansali, S. Brankovic, D. A. Buttry, D. Chu, H. Imahori, H. Katayama, O. Leonte, S. Mukerjee, R. Mukundan, Y. Oren, L. Romankiw, N. Sharma, A. Simonian, P. C. Trulove, J. T. Vaughey, M. Winter, P. N. Bartlett, V. Di Noto, M. Doeff, T. Druffel, J. M. Fenton, J. Fergus, Y. Fukunaka, M. Itagaki, J. Koehne, R. Kostecki, R. P. Lynch, I. Milosev, S. R. Narayan, V. Subramanian, T. Tatsuma, N. Wu, Z. Chen, L. M. Haverhals, P. Hesketh, A. C. Hillier, M. Inaba, G. Krumdick, J. Leddy, M. Manivannan, V. Maurice, S. Mitra, J. Muldoon, J. Noel, K. Rajeshwar, V. R. Subramanian, A. H. Suroviec, K. Suto, G. Zangari, P. Allongue, N. Birbilis, O. V. Boltalina, S. Calabrese Barton, V. Chaitanya, D. Chidambaram, J. K. Hite, J. J. Lee, R. A. Mantz, J. Mauzeroll, S. D. Minteer, M. E. Orazem, R. P. Ramasamy, D. P. Riemer, D. Roeper, M. Rohwerder, M. J. Sailor, D. T. Schwartz, J. A. Staser, G. Wu, H. Xu, R. Alkire, T. J. Anderson, M. Bayachou, A. B. Bocarsly, J. W. Choi, M. Innocenti, S. H. Kilgore, D. J. Kim, P. J. Kulesza, Y. C. Lu, P. Marcus, M. Mauter, J. D. Nicholas, S. Pylypenko, C. Rhodes, L. Soleymani, M. Tao, Y. Xing, A. P. Abbott, B. A. Chin, D. E. Cliffel, E. A. Douglas, K. Edstrom, H. Hamada, H. N. McMurray, Y. S. Meng, E. L. Miller, M. Navaei, S. S. Nonnenmann, C. O'Dwyer, P. Pharkya, S. V. Rotkin, J. L. M. Rupp, G. Williams, C. Bock, R. Buchheit, G. T. Cheek, H. Deligianni, C. Johnson, J. G. Park, P. N. Pintauro, K. C. Smith, P. Vanysek, H. Wang, J. F. Whitacre, J. Xiao, M. T. Carter, N. Dimitrov, J. Fransaer, D. Guyomard, B. L. Lucht, L. Nagahara, P. M. Natishan, P. K. Sekhar, D. K. Smith, G. R. Stafford, K. B. Sundaram, N. Vasiljevic, S. Virtanen, W. Wang, D. L. Wood, ... J. J. Yang (Eds.), ECS Transactions (10 ed., pp. 1407-1413). (ECS Transactions; Vol. 80, No. 10). Electrochemical Society Inc.. https://doi.org/10.1149/08010.1407ecst