Effect of annealing on the tolerance of LiCaAlF6 single crystals against F2 laser irradiation

Yoshizo Kawaguchi, Aiko Narazaki, Tadatake Sato, Ryozo Kurosaki, Hiroyuki Niino, Hiroki Sato, Tsuguo Fukuda

Research output: Contribution to journalArticle

Abstract

The optical tolerance of annealed LiCaAlF6 single crystals against F2 laser irradiation was investigated. Annealed LiCaAlF 6 (t = 1.45 mm) shows an improved transmittance at 157 nm, 94.4% after the compensation of the surface reflection loss. Furthermore, after the initial increase by F2 laser cleaning, transmittance at 157 nm remains almost unchanged even after irradiation with a F2 laser beam up to 105 pulses at a fluence of approximately 160 mJ cm-2 pulse-1.

Original languageEnglish
Pages (from-to)6168-6169
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number9 A
DOIs
Publication statusPublished - 2004 Sep 1

Keywords

  • Annealing
  • F laser
  • LiCaAlF
  • Optical tolerance
  • Transmittance
  • Vacuum ultraviolet light

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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