Effect of annealing on electronic characteristics of HfSiON films fabricated by Damascene gate process

K. Yamabe, K. Murata, T. Hayashi, T. Tamura, M. Sato, A. Uedono, K. Shiraishi, N. Umezawa, T. Chikyow, H. Watanabe, Y. Nara, Y. Ohji, S. Miyazaki, K. Yamada, R. Hasunuma

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science